Optimizing Sputter Deposition Conditions of Silver Thin Films Used in Low-Emissivity Coatings in an In-Line Deposition System

This research sought to determine the optimal conditions for depositing thin silver layers in fabrication of low-emissivity coatings. The study utilized an in-line semi-industrial high-vacuum magnetron sputtering system with rectangular targets, closely resembling those used industrial settings. Trilayer AZO/Ag/AZO structures were deposited enhance wetting properties silver, and protect it from atmosphere. effects power argon flow on sample analyzed, along variations thickness. results demonstrate that a lower (200 W) higher flows (1000 sccm) lead transmittance sheet resistance, resulting reduced emissivity (up 0.015 24 nm silver). identified offer valuable recommendations producing more efficient optically superior also reveals importance thickness coatings, accordance previous findings. These findings provide insights improving performance coatings various applications.